Saturday, April 10, 2010
WHAT: CLOAK Apparel, Inc. will be launching their new collection “CLOAK+LOVE,” benefiting the earthquake victims in Haiti in a multi-faceted fashion event. The event will be a celebration of the beauty of Haitian culture and aims to raise funds for Peacemakers’ Peace for Haiti – Earthquake Relief humanitarian effort, which is the perfect collaboration of several organizations coming together to provide urgent aid for Haiti.
WHO: The anticipated “CLOAK + LOVE” fashion event will combine fashion, music and art to create a mosaic of unity and love for the socially conscious fashionista. Since 2008, CLOAK has supported organizations focused on Haiti relief. With an unwavering passion to give back to the community, CLOAK will be raising the funds through donations collected for entry into the event and auctioned artwork to benefit Peacemakers’ Peace for Haiti – Earthquake Relief humanitarian effort, which is the perfect collaboration of several organizations coming together to provide urgent aid for Haiti. The event will feature an edgy fashion exhibition. Performances inspired by Haiti will from artists such as: renowned Haitian spoken word artist and activist, Mecca aka Grimo, choreographer, Angela Lowe, esteemed recording artist Jowee Omicil, and surprise guests. Fine artist, Terrance Wilson will be doing a live painting throughout the event and music will be provided by Zack of Element DJs. David D. Jaded will provide hair styling. Attendees will have the opportunity to participate in an interactive painting which will be auctioned off to benefit Peace for Haiti. CLOAK will also promote their “Give One, Get One” campaign, which will donate one shirt for every shirt purchased from a select line for the Haiti initiative.
WHEN: Saturday, April 10, 2010 at 7 p.m.
WHERE: Moore Building in Design District, 4040 N.E. 2nd Ave. Ste. 103, Miami, FL 33137
COST: $10 will be collected for entry into the event of which 100% will be donated to Peace for Haiti, who will be onsite at the event. Donation is not mandatory for press.